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FDA 510(k)

HIGH VOLTAGE PULSED GALVANIC STIMULATION APPLICATI

K-Number: K910801 · 1991-09-04

ApplicantPsychoenergetic Systems, Inc.
Decision Date1991-09-04
Product CodeIPF
Advisory CommitteePM
DecisionSubstantially Equivalent

Device Summary

HIGH VOLTAGE PULSED GALVANIC STIMULATION APPLICATI is the device name listed in this FDA 510(k) record. The listed applicant is Psychoenergetic Systems, Inc.. It received FDA 510(k) clearance on 1991-09-04 under 510(k) number K910801. The device is classified under product code IPF. It was reviewed by the PM advisory panel. FDA Decision: Substantially Equivalent.

Frequently Asked Questions

What is the HIGH VOLTAGE PULSED GALVANIC STIMULATION APPLICATI?

HIGH VOLTAGE PULSED GALVANIC STIMULATION APPLICATI is a medical device that received FDA 510(k) clearance on 1991-09-04. The listed applicant is Psychoenergetic Systems, Inc.. The 510(k) number is K910801.

When did HIGH VOLTAGE PULSED GALVANIC STIMULATION APPLICATI receive FDA 510(k) clearance?

HIGH VOLTAGE PULSED GALVANIC STIMULATION APPLICATI received FDA 510(k) clearance on 1991-09-04, under 510(k) number K910801.

Who is the listed applicant for HIGH VOLTAGE PULSED GALVANIC STIMULATION APPLICATI?

The FDA 510(k) record lists Psychoenergetic Systems, Inc. as the applicant. This does not by itself establish the device manufacturer.

What is the FDA product code for HIGH VOLTAGE PULSED GALVANIC STIMULATION APPLICATI?

The FDA product code for HIGH VOLTAGE PULSED GALVANIC STIMULATION APPLICATI is IPF.

Related Clinical Trials

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Other records listing Psychoenergetic Systems, Inc. as applicant

Related records are matched automatically using names, product codes, or other metadata. A match does not establish a verified clinical, scientific, corporate, or regulatory relationship; review the linked official sources.

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Related Devices (Code: IPF)

Related records are matched automatically using names, product codes, or other metadata. A match does not establish a verified clinical, scientific, corporate, or regulatory relationship; review the linked official sources.

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Official Source

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